Characterization of Aerosol Deposited Cesium Lead Tribromide Perovskite Films on Interdigited ITO Electrodes

Aerosol deposition (AD) is a promising additive manufacturing method to fabricate low-cost, scalable films at room temperature, but has not been considered for semiconductor processing, so far. The successful preparation of cesium lead tribromide (CsPbBr3) perovskite on interdigitated indium tin oxide (ITO) electrodes by means AD reported here. 20–35 µm thick layers are dense and have good adhesion the substrate. orthorhombic Pnma crystal structure precursor powder was retained during process with no signs defect formation. formation electronic defects photoluminescence spectroscopy investigated found slightly increased carrier recombination from sites compared powder. A nonuniform distribution across layer, presumably induced impact semiconducting grains hard substrate surface, revealed. opto-electronic properties processed further tested electrical measurements confirmed high responsivity films. These results demonstrate that processing metal halide perovskites possible device 3D surfaces. It believed this work paves way fabrication previously unimaginable devices manufacturing.